CIGS Evaporator *Deposition thickness: up to several ten thousands ¡Ê for CIGS film
*Film thickness uniformity: ¡Â ¡¾ 5 % on 100 x 100 mm2 substrate
*In-situ temperature monitoring software of depositing CIGS film
TCO Cluster Type for SolarCell *Loading Chamber(LC) + Process Chamber (PM1, PM2) + Transfer Chamber (TM)
*Magnetron Sputtering System / E-Beam & Thermal Evaporating System
*Film Uniformity <+/- 5% (at 100X100 Glass, sample except the 5mm edge)
Cluster type MOCVD System for SolarCell *CVD Processing -Vacuum Processing Chamber
*Max. 4¡± Wafer Process
*Substrate Temperature : Max. 1100¡É
*Gas Supply Unit using MFC, Pneumatic Valve & Plasma Unit
*Bubbler Bath with Controller